The Film and Television Institute of India (FTII) is introducing three new short-term courses in New Delhi. The courses will be conducted from 12th July to 3rd August at the Indian Institute of Mass Communication (IIMC) , which is located at the new campus of the Jawaharlal Nehru University (JNU) Delhi. The last day to apply for all the three short-term courses is 27th June.
FTII Short-Term Courses in Delhi 2018:
The three courses are as follows:
- Screen Acting
- Digital Cinematography
- Fiction Writing for Television
All these three courses are the foundation for a career in fil-making, especially for beginners. The courses will mainly focus on basic skill set and subjects with respect to film-making.
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As per the reports, these short courses by FTII are part of the Skilling India in Film and Television (SKIFT) programme. These short courses will provide candidates with a platform to develop their skills and vocational knowledge. After pursuing these courses, aspirants are fully-equipped to pursue a career in film and television, cinematography, recording, editing values and production. This course also includes basic acting courses which are taught by the FTII’s in-house faculty itself.
The institute is already running a summer film appreciation course at the Pune campus. The film appreciation course began on 6th May and the last day of the course is 2nd June. The courses offer candidates with knowledge about Indian and international cinema. They also learn about different genres of films.
As per the official release of FTII, over 72 participants from 15 states and union territories have applied for the 21-day foundational courses. The age range of the of the foundational courses ranges from 18 to 55 years of age. The applicants range from different academic qualifications and professions.
Also Read: FTII to Introduce Film Making Courses at Punjabi University
FTII Alumni such as Avinash Roy, Siddharth Shasta, and Jasmine Kaur Roy and cinematographer Wasimberry Maner are the directors for these foundational courses.